87.3 Applications of Conductivity Measurement 1. Monitor the purity of water Fabrication of VLSI In-situ monitoring of the cleaning water Tap Distilled Deionized Pure process:H2O2/H2SO4→ DW rinse→ water water water water dilute hF→SC-1 cleaning→Dw κsm11×102-1×103<1×10+5.478×106 rinse→〉 hot dw rinse→ DW rinse→ SC-2 cleaning→ DW rinse→> dilute FF→ DW rinse 第12卷第1期 化学进展 Vol 12NO I 2000年2月 PRO GRESS N CHEM ISTRY Feb.1999 DW--deionized water 超大规模集成电路硅片溶液清洗技术的进展 SC-standard cleaning: 张树永郭永榔 (山东大学化学学院济南250100 SC-1: H./NH: SC-2: H,O/HCI 曹宝成于新好In-situ monitoring of the cleaning process: H2O2 /H2SO4 → DW rinse → dilute HF → SC-1 cleaning → DW rinse → hot DW rinse → DW rinse → SC-2 cleaning → DW rinse → dilute HF → DW rinse. DW⎯deionized water, SC ⎯ standard cleaning： SC-1: H2O2 /NH3 ; SC-2: H2O2 /HCl. 1. Monitor the purity of water Fabrication of VLSI water Tap water Distilled water Deionized water Pure water /S·m-1 1 10-2 ~1 10-3 <1 10-4 5.478 10-6 §7.3 Applications of Conductivity Measurement