应用实例三In-situ high-TXRD- 2242 TisSis (3251) Intensity(arbitary unit) *L.T.Zhang and J.S.Wu,Scripta 0.755 200 400 Materialia,38(1998)307 TSia 59 60 61 0.750 29 64 65 1000 66 0.745 0.520 0.740 0.515 ● a-axis c-axis 0.735 0.510 0 200 400 600 800 1000 0 200 400 600 800 1000 Temperature(C) Temperature(C)*L.T. Zhang and J.S. Wu, Scripta Materialia, 38(1998)307 应用实例三 In-situ high-T XRD- Ti5Si3