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Nano Letters LETTER NWs were aligned on the PET substrate along the sweeping 2(12) Chen. L: Wang w2000, 77(8),1224-1228 Price, Dw-i substrate by sweeping the PEt substrate across the NWs. Zno Reed, M. A; Rawlett, A M our,J. M. AppL. Phys. Lett. direction due to the applied shear force. Drain/source electrodes (13)Baikalov, A; Wang, Y Q; Shen, B. Lorenz, B. Tsui, S. Sun, were defined and patterned over the transferred ZnO NWs by YY;Xue, YY; Chu, C W. AppL Phys. Lett. 2003, 83(5),957-959 photolithography and metal evaporation/lift off steps. After lift (14)Dong, Y ]; Yu, G H; McAlpine, M.C.; Lu,W;Lieber, C.M. off step, a substantial amount of the ZnO NWs was patterned Nano Lett.2008,8(2),386-391 ith ordered Au electrodes(Supporting Information Figure S7 (15)Seo, S. Lee, M. J; Seo, D H; Jeoung, E. J Suh, D S. Joung, Plasma treatment was performed to control and adjust th Y.S. Yoo, IK; Hwang, I R; Kim, S H; Byun, L.S. Kim, J S. Choi, J S Park, B. H. AppL. Phys. 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