In-situ high-T XRD-TisSig 2242) (3251) Intensity(arbitary unit) 0 200 *L.T.Zhang and J.S.Wu,Scripta 400 59 Materialia,38(1998)307 60 600 0.755 61 29 64 800 Temperature Ti Sia 65 1000 66 0.7501 0.525 ● 0.745 0.520 0.740 0.515 ● ● a-axis c-axis 0.735 0.510 0 200 400 600 800 1000 0 200 400 600 800 1000 Temperature(C) Temperature(°c)*L.T. Zhang and J.S. Wu, Scripta Materialia, 38(1998)307 In-situ high-T XRD-Ti5Si3