6.152J/3.155J Thin fllm growth detalls (R< 1) 1) Arrival rate. 3)Chemical adsorptio 4 Nucleation 6) Bulk diffusion 2) Surface If R> 1, these processes have reduced probablity Wed, Sept. 10, 2003 Looking ahead Thin films made by a variety of means: thermal vapor deposltlon(evaporation) for metals Physlcal vapor deposition (PVD) sputter deposition DC-magnetron- for metals .RF for oxides chemIcal vapor deposltlon ChemIcal vapor deposition for metals, semiconducto (CVD) 6.152J3.155 Wed, Sept 10, 2003 106.152J/3.155J Thin film growth details (R < 1) 1) Arri phys l i l i i l i l i Bu di i R ≡ Rate of arrival va rate, ca adsorpt on 3) Chem ca react on 4) Nuc eat on 5) Growth 6) lk ffus on Diffusion rate 2) Surface diffusion If R > 1, these processes have reduced probability 6.152J/3.155J Wed., Sept. 10, 2003 19 Looking ahead… Thin films made by a variety of means: thermal vapor deposition (evaporation) Physical vapor deposition - for metals (PVD) sputter deposition DC-magnetron- for metals -RF for oxides chemical vapor deposition Chemical vapor deposition - for metals, semiconductors (CVD) 6.152J/3.155J Wed., Sept. 10, 2003 20 10