微细加工技术 2005年 Motion Controller Design of Precision Stage Based on Linear Motor YANG Kai-ming, YE Pei-qing, YIN Weng-sheng Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084, China) Abstract: In order to improve the tracking accuracy and dynamical response of the precision stage based on the discrete model of the identified control object, pole assignment method is used to de- sign the feedforward loop and feedback loop of the motion controller for the precision stage. In the test experiments, compared to the PD control with acceleration feedforward, the static positioning accuracy is improved by 0.5 um, and the tracking accuracy is improved by 3 um at the uniform show that motion controllers based on the pole assignment method have much better dynamical re- sponse and tracking performance Key words: precision stage; linear motor; motion control; pole assignment (上接第41页) J Micromech Microeng, 2003, 13: 380-382 plications in micro-electro-mechanical syste [9 Manhee Han, Lee Woonseob, Lee Sun-Ke (MEMS)[J]. Polymer Testing, 2001,20 UV lithography [J]. Sensors and Actuators, [7] Kudryashov V, Yuan X C, Cheong W C, et al 2004,A111:14-20. Grey scale structures formation in SU-8 with e [10] Ling Zhonggeng, Lian Kun, Jian Linke.Im eam and Uv[J].Mi proved patterning quality of sU-8 microstru 2003,67-68:306-311 tures b [8] Peter M C, Huie P, Bloom D M, et al. Building [A]. Proc SPIE-Int Soc Opt Eng[C].USA thick photoresist structures from the bottom up[J] sPIE,2000,3999:1019-1027 Process Optimization of Optical Lithography of su-8 Photoresist ZHANG Ye, CHEN Di, ZHANG Jin-ya, NI Zhi-ping, ZHU Jun, LiU Jing-quar State Key Laboratory of Micro/Nano Fabrication Technology, Thin Film and Microtechnology Key Laboratory of Ministry of Education, Institute of Micro/Nar Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, China Abstract: Process parameters of SU-8 photoresist based UV-LIGA technique were optimized. The influences of expose time and the wavelength of expose source(on the resist formation) were in- tigated. The line width of photoresist surface first decreased then increased with expose It has a minimum. The sidewall angle first increased then decreased with expose time. It has a maximum. We have optimized the process parameters like wavelength of expose source, expose time and developing time to fabricate 300 Am-thickness microstructures with sidewall angle of 0.64 and those of 500 um-thickness with sidewall of 89.98% Key words: UV-LIGA; SU-8 photoresist; high aspect ratio; microstructure 万方数据80 微细加工技术 2005年 YANG Kai—ming，YE Pei—qing，YIN Weng-sheng (Department of Precision Instruments and Mechanology，Tsinghua University，Beijing 100084，China) Abstract：In order to improve the tracking accuracy and dynamical response of the precision stage， based on the discrete model of the identified control object，pole assignment method is used to de— sign the feedforward loop and feedback loop of the motion controller for the precision stage．In the test experiments，compared to the PD control with acceleration feedforward，the static positioning accuracy is improved by O．5 ttm，and the tracking accuracy is improved by 3 ttm at the uniform speed of 120 mm／s，while the positioning establishment time is reduce by 10 ms．The results show that motion controllers based on the pole assignment method have much better dynamical re— sponse and tracking performance． Key words：precision stage；linear motor；motion control；pole assignment (上接第41页) applications in micro-electro-mechanical systems (MEMS)[J]．Polymer Testing，2001，20： 693—701． [7]Kudryashov V，Yuan X C，Cheong W C，et a1． Grey scale structures formation in SU-8 with e。 beam and UV[J]．Miercelectronic Engineering， 2003，67—68：306—311． [8]Peter M C，Huie P，Bloom D M，et a1．Blfilding thick photoresist stmctm,℃s from the bottom up[J]． J Micromech Mieroeng，2003，13：380—382． [9] Manhee Han，Lee woonseob，Lee Sun-Keun，et a1．3D mierofabrication with inelined／rotated UV lithography[J]．Sensors and Actuators， 2004．A111：14—20． [10]Ling Zhong-geng，Lian Kun，Jian Linke．Im— proved patterning quality of SU--8 mierostrue·· tures by optimizing the exposure parameters [A]．Proo SPIE-Int Scc Opt Eng[C]．USA： SPIE．2000，3999：1019—1027． ZHANG Ye，CHEN Di，ZHANG Jin—ya，NI Zhi—ping，ZHU Jun，LIU Jing—quan (State Key Laboratory of Miero／Nano Fabrication Technology，Thin Film and Mierotechnology Key Laboratory of Ministry of Education，Institute of Micro／Nano Science and Technology，Shanghai JiaoTong University，Shanghai 200030，China) Abstract：Process parameters of SU一8 photoresist based UV—LIGA technique were optimized．The influences of expose time and the wavelength of expose source(on the resist formation)were in— vestigated．The line width of photoresist surface first decreased then increased with expose time． It has a minimum．The sidewall angle first increased then decreased with expose time．It has a maximum．We have optimized the process parameters hke wavelength of expose source，expose time and developing time to fabricate 300肛m．thickness microstructures with sidewall angle of 90．640 and those of 500 um．thickness with sidewall of 89．980． Key ： ． ； 一 UV LIGA SU 8 photoresist ； high aspect ratio；．words microstructure 万方数据