正在加载图片...
Patterning materials at the nanoscale 6.12J/3.155J Microelectronic processing Outline 1. Introduction- How small would you like to go?... can you go 2. Optical and other lithography 3. Subtractive and additive patterning 4. More exotic patterning methods: Interference (Imprint,) Block copolymers elf asse (Building on last years notes of Caroline ross) Dec.10,2003D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing Patterning materials at the nanoscale Outline 1. Introduction - How small would you like to go?… can you go? 2. Optical and other lithography 3. Subtractive and additive patterning 4. More exotic patterning methods: Interference, (Imprint,) Block copolymers Self assembly (Building on last year’s notes of Caroline Ross)
向下翻页>>
©2008-现在 cucdc.com 高等教育资讯网 版权所有