·104· 北京科技大学学报 1997年第1期 4 Maya L,Cole D R,Hagaman E W.J Am Ceram Soc,1991,74:1686 5 Cuomo J J,Leary P A,Reuter Yu D,Frisch M.J Vac Sci Technol,1979,16(2):299 6 Chen M Y,Li D,Lin X,Dravid V P,Cung Y-W,Wong M-S,Sproul W D.J Vac Sci Technol, 1993,A11(3521 7 Chen M Y,Lin X,Dravid V P,Chung Y W,Wong M S,Sproul W D.Surf.and Coat Technol, 1992,54/55:360 8 Li D,Chung Y P,Wong M S,Sproul W D.J Appl Phys,1993,74(1):219 9 Chen M Y,Lin X,Dravid V P,Chung Y W,Wong M S,Sproul W D.Tribology Transaction, 1993,36:491 10 Fujimoto F,Ogata K.Jpn J Appl Phys,1993,32:L420 11 Niu C,Lu Y Z,Lieber C M.Science,1993,261:334 12陆家和，陈长彦主编.表面分析技术.北京：电子工业出版社，1987.213 13 Cohen M L.Science,1993,261:307 Preparation and Characterization of Magnetron Sputtered CN,Films Cheng Degang Lu Fanxiu Yang Lianyin Song Bo Tong Yumei Material Science and Engineering School,UST Beijing.Beijing 100083,China ABSTRACT CN.films have been prepared by DC magnetron sputtering of graphite in pure nitrogen atmosphere.N/C ratio is between 0.21 and 0.42,strongly correlating with deposition parameters.The hardness and modulus are related not only to the N/C ratio, but also to the formation and the amount of C=N triple bonds in the CN.films.High bias voltage and high sputtering power are beneficial to the increase of C=N bands and so are helpful to increase the hardness and bulk modulus. KEY WORDS magnetron sputtering,carbon nitride film,hardness104 · 北 京 科 技 大 学 学 报 19 97 年 第 1期 4 M a y a L , C o l e D R , H a g am an E W . J A m C e ar m S o e , 1 99 1 , 74 : 1 6 8 6 5 C uo m o J J , L e a yr P A , eR u ter Y u D , F ir s e h M . J V ac S e i T ec hn o l , 19 7 9 , 16 ( 2 ) : 2 99 6 C h e n M Y , L I D , L in X , D var i d V P , C un g Y 一 W , W o n g M 一 S , SP or u l W D . J V ac S e i T e e hn o l , 1 9 9 3 , A l l ( 3 ) : 5 2 1 7 C h en M Y , L in X , D var i d V P , C h u n g Y W , W o n g M S , SP or u l W D . S u 迁 a n d C o at Tce h n o l , 1 9 9 2 , 5 4 5/ 5 : 3 6 0 8 L I D , C h un g Y P , W o n g M S , S Por u l W D . J A PP I Ph y s , 1 9 9 3 , 7 4 ( l ) : 2 1 9 9 C h e n M Y , L in X , D var id V p , C h u n g Y W , Wo n g M S , SP or u l W D . T ir b o lo gy T r an s ac it o 氏 1 9 9 3 , 36 : 4 9 1 10 F uj u n o ot F , o g a at K . J P n J A p l Phy s , 19 9 3 , 3 2 : 4L 2 0 1 1 N i u C , L u Y Z , L i e b e r C M . S e i e n e e , 1 9 9 3 , 2 6 1 : 3 3 4 12 陆家和 , 陈长彦主编 . 表 面分析技术 . 北 京: 电子工业 出版社 , 19 87 . 2 13 13 C o he n M L . S e i e nc e , 1 9 9 3 , 2 6 1 : 3 0 7 P r e P ar at i o n an d C h ar a c t e r i z at i o n o f M a g n e tr o n S P u t e r e d C N : F ilm s hC e n g D 只g a n g L u aF n x iu aY n g L ia ny i n OS n g B o oT n g uY m e i M a t e ir al S e i e n e e an d E n g i n e e inr g S e h o o l , U S T B e ij in g , B e ij i n g l X() 0 8 3 , C h」n a A B S T R A C T C N : if ln s h a v e b e e n P r e Par e d b y D C m a g n e tr o n s P u t e ir n g o f g r aP h it e in P ure n itr o g e n a tl n o s Ph e r e . N /C art i o 1 5 b e tw e e n 0 . 2 1 an d 0 . 4 2 , s tr o n g l y e o r e l iat n g w iht d e P o s it i o n Par am e et sr . T h e h ar d n e s s an d m o d u l u s ar e er lat e d n o t o n l y t o ht e N /C art i o , b u t a l s o t o ht e fo mr at i o n an d ht e am o un t o f C 兰 N itr Pl e b o n d s i n ht e C N 二 if lm s . H ihg b i a s v o l at g e an d h i g h s P u t e irn g P o w e r ar e b e n e if e i a l t o ht e in e er a s e o f C 三 N b an d s an d 5 0 aer h e lPfu l t o in e r e a s e ht e h a r dn e s s an d b u lk m o d u l u s . K E Y WO R D S m a g n e otr n s P u et ir n g , e ar b o n n iitr d e if ln , h ar d n e s s