Contact/ Proximity Printing Aperture Resist Wafer Incident Plane Wave Proximity Projection Contact Light Intensity at Resist Surface Separation Depends on Type of System Fall 2003-MA Schmidt 3.155]6.152]-Lecture 10-Slide 9Contact/Proximity Printing Fall 2003 – M.A. Schmidt 3.155J/6.152J – Lecture 10 – Slide 9