Contact/ Proximity Printing Mask Incident Plane Wave Aperture Resist Wafer Applies when x <g< w2/it inestyrRrs Minimum resolvable feature =(g)1/2 Fall 2003-MA Schmidt 315516.152]- Lecture10-side9Contact/Proximity Printing Fall 2003 – M.A. Schmidt 3.155J/6.152J – Lecture 10 – Slide 9 Applies when O < g < W 2 / O Minimum resolvable feature = ( Og)1/2