Definitions Metrics Resolution Throughtput Registration(Alignment) Exposure Systems-UV Projection -Fraunhofer Proximity-Fresnel Contact -Fresnel Advanced DUV, E-Beam, X-Ray, Nano-imprint Resists a Positive/Negative Contrast CMTE Fall 2003-MA Schmidt 3. 155] 6. 152]-Lecture 10-Slide 7Definitions „ Metrics „ Resolution „ Throughtput „ Registration (Alignment) „ Exposure Systems - UV „ Projection - Fraunhofer „ Proximity - Fresnel „ Contact - Fresnel „ Advanced „ DUV, E-Beam, X-Ray, Nano-imprint „ Resists „ Positive/Negative „ Contrast „ CMTF Fall 2003 – M.A. Schmidt 3.155J/6.152J – Lecture 10 – Slide 7