Pattern Transfer Steps Coat with photoresist pose Mask ++t Develop Etch Strip resist Wet etch Fall 2003-MA Schmidt 3.155]6.152]-Lecture 10-Slide 6Pattern Transfer Steps Mask Coat with photoresist Develop Strip resist Expose Etch* *Wet etch Fall 2003 – M.A. Schmidt 3.155J/6.152J – Lecture 10 – Slide 6