International Technology roadmap for Semiconductors: 2002 6.12J/3. 155J Microelectronic processing YEAR OF PRODUCTION200120021203204205120012007 DRAM Pitch (m)130 115 100 0 80 70 65 MPU为 Pitch(nn 1301079080 MPUPrinted Gate Length(n) 75655345 4 35 MPU Physical Gate Length (en) 534537322825 YEAR OFPRODUCTION 201020132016 DRAM Pitch (nm) 453222 MPU Pitch (* y 4532|22 MPU Printed Gate Length(nm) 251813 MPU Physical Gate Length(/w) 18139 N≈50n10×10×10m3 Dec.10,2003D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing International Technology Roadmap for Semiconductors; 2002 Nd ≈ 50 in 10x10x10 nm3