Subtractive and additive patterning 6.12J/3.155J Microelectronic processing Whichever lithography method is used, structures are created by subtractive or additive patterning. Subtractive patterning requires removal (etching) of the magnetic material magnetic material substrate a)deposit magnetic material (b)define template on top (c)remove magnetic material (d)remove template Dec.10,2003D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing Subtractive and additive patterning Whichever lithography method is used, structures are created by subtractive or additive patterning. (c) remove magnetic material (d) remove template substrate (a) deposit magnetic material (b) define template on top magnetic material template Subtractive patterning requires removal (etching) of the magnetic material