lon Implantaton Eq山mnt Ions generated in a source(from feed gas, e.g. BF3, ASH3, PH3.or heated solid source, then ionized in arc chamber by electrons from hot filament select desired species by g/m, using a magnet, accelerated by an e-field and focused using electrostatic lenses and impact substrate a bend removes neutrals )in raster pattern Resolving Aperature Focus Analyzing Magnet 0-200ke Neutral Trap X &Y scan Plates Wafer Neutral Beam 0-30keV Ion S Faraday Cup 3.155J/6.152J,2003Ion Implantation Equipment Ions generated in a source (from feed gas, e.g. BF3, AsH3, PH3 ... or heated solid source, then ionized in arc chamber by electrons from hot filament) select desired species by q/m, using a magnet, accelerated by an E-field and focused using electrostatic lenses and impact substrate (a bend removes neutrals) in raster pattern. 3.155J/6.152J, 2003 7