d) Use one of the figures below to answer the following questions for reaction rate-limited growth of a p-doped gate oxide i. Circle the reaction rate-limited regime on each of the figures ii. Will the dopant concentration in the gate oxide be likely to be affected by the gas flow rate? Why? iii. What processing parameter would be best to control the ratio of dopant to SiO2 concentration in the gate oxide layer? iv. Sketch on the appropriate figure below how that processing variable in part iii would change the figure(assume the figures as given to you apply to the SiO2 parameters In(v) (v) 1000K K 8Name: ___________________________ d) Use one of the figures below to answer the following questions for reaction rate-limited growth of a p-doped gate oxide: i. Circle the reaction rate-limited regime on each of the figures below. ii. Will the dopant concentration in the gate oxide be likely to be affected by the gas flow rate? Why? iii. What processing parameter would be best to control the ratio of dopant to SiO2 concentration in the gate oxide layer? iv. Sketch on the appropriate figure below how that processing variable in part iii would change the figure (assume the figures as given to you apply to the SiO2 parameters). ln (v) ln (v) 1 / T u0 T 1000 K 400 K 8