Beyond Optical a X-Ray Masks Wavelength Energy ■ Sources Light U\ 400 nm E-Beam a Speed E Deep uv 250 nm 4.96eV Electron Scattering X-Ray 0.5nm 2480el a Nano-imprint Soft-Litho h1.23 mv ve(e Fall 2003-MA Schmidt 3.] 6. 152]-Lecture 11-Slide 18D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing l = hc E l = h mv = 1.23 E(eV) (Å)