Can Projection lithography get you there? 6.12J/3.155J Microelectronic processing OBJECT PLACEHOLDER OBJECT PLACEHOLDER This object has been removed because it is not This object has been owned by MIT. It may be removed because it is not reinstated or replaced in owned by MT. It may be reinstated or replaced in Fraunhoffer(far field diffraction) imum resolved feature nfld(no limit on lens diameter, d For f=d, n=436 nm=>0.4 microns Dec.10,2003D e c. 10 , 2 0 0 3 6.12J / 3.155J Microelectronic processing Fraunhoffer (far field diffraction): Minimum resolved feature = lf/d (no limit on lens diameter, d) Can Projection lithography get you there? For f ≈ d, l = 436 nm => 0.4 microns OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future. OBJECT PLACEHOLDER This object has been removed because it is not owned by MIT. It may be reinstated or replaced in future