In-situ high-T XRD-TisSig (2242) (3251) Intensity(arbitary unit) 0 200 E 400 59 60 600 61 800 aunejedwe *L.T.Zhang and J.S.Wu,Scripta Materialia,38(1998)307 29 64 0.755 65 1000 66 Ti Sia Ti Sig 0.750 0.525 0.745 0.520 0.740 0.515 ● ●a-axis ● c-axis 0.735 1 0.510 0 200 400 600 800 1000 0 200 400 600 800 1000 Temperature(C) Temperature(C)*L.T. Zhang and J.S. Wu, Scripta Materialia, 38(1998)307 In-situ high-T XRD-Ti5Si3