p-well Formation 1)第二层掩膜 2)P井注入(高能) 3)退火 Boron implant Thin Films Polish Photoresist I Diffusion Etch n-well 32) p-well Implant Epitaxial laye p+ silicon substrate 半导体制造技术 电信学院微电子教研室 Figure 9.9 by michael Quirk and Julian Serda半导体制造技术 电信学院微电子教研室 by Michael Quirk and Julian Serda p-well Formation 1)第二层掩膜 2) P井注入(高能) 3)退火 Thin Films 3 1 2 Photo Implant Diffusion Polish Etch p+ Silicon substrate Boron implant 1 Photoresist p- Epitaxial layer Oxide 3 n-well 2 p-well Figure 9.9