STI Formation 1)浅曹氧化物抛光(化学机械抛光) 2)氮化物去除 Planarization by chemical-mechanical polishing Thin Polish Films STI Oxide after polish 〔2 Nitride strip Diffusion Photo n-well Liner oxide p-Epitaxial layer p+ silicon substrate 半导体制造技术 电信学院微电子教研室 Figure 9.12 by michael Quirk and Julian Serda半导体制造技术 电信学院微电子教研室 by Michael Quirk and Julian Serda STI Formation 1）浅曹氧化物抛光（化学机械抛光） 2）氮化物去除 Thin Films 1 2 Diffusion Photo Etch Implant Polish p-well 1 2 Planarization by chemical-mechanical polishing STI oxide after polish Liner oxide p+ Silicon substrate p- Epitaxial layer n-well Nitride strip Figure 9.12