对于中规模、大规模和某些VLSI的IC,前面介绍的基本光刻工艺完全适用,然而 ,对于ULSI/VLSI IC 这些基本工艺已经明显力不能及。在亚微米工艺时代,某些光刻工艺在0.3µm以下明显显示出它的局限性。存在地问题主要包括:光学设备的物理局限;光刻胶分辨率的限制;晶园表面的反射现象和高低不平现象等
18.1 Special Architectures Pipelining. Parallel Processing. Retiming. Unfolding. ia Folding Transformation Look-Ahead Technique. Associativity Transformation. Distributivity Arithmetic Processor Architectures. Computer-Aided Design. Future VLSI DSP Systems Keshab K. Parhi 18.2 Signal Processing Chips and Applications University of Minnesota System. Implementation of a Finite Impulse Response Filter with Rulph Chassaing the TMS320C25. Floating-Point TMS320C30-Based Development Roger Williams University